Study of reactive ion beam sputtered hydrogenated amorphous silicon, germanium and their alloy films

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dc.contributor.authorKrishan, Bhan Mohan
dc.date.accessioned2025-03-12T05:59:29Z
dc.date.issued1989-05-01
dc.identifier.urihttp://ir.iitd.ac.in/handle/123456789/7496
dc.language.isoen
dc.publisherIIT Delhi
dc.subjectReactive Ion Beam Sputtering
dc.titleStudy of reactive ion beam sputtered hydrogenated amorphous silicon, germanium and their alloy films
dc.typeThesis

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