Doped, alloyed and pure hydrogenated amorphous silicon prepared by reactive ion beam sputtering

Simple item page
dc.contributor.authorSingh, Jagriti
dc.date.accessioned2025-03-01T08:24:21Z
dc.date.issued1985-10-01
dc.identifier.urihttp://ir.iitd.ac.in/handle/123456789/7329
dc.language.isoen
dc.publisherIIT Delhi
dc.subjectNATURAL SCIENCES::Physics
dc.titleDoped, alloyed and pure hydrogenated amorphous silicon prepared by reactive ion beam sputtering
dc.typeThesis

Files

Original bundle

Now showing 1 - 1 of 1
No Thumbnail Available
Name:
TH-1340 _ABSTRACT.pdf
Size:
411.83 KB
Format:
Adobe Portable Document Format
Download

License bundle

Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
1.71 KB
Format:
Item-specific license agreed to upon submission
Description:
Download

Collections

Department of Physics