Properties of RF plasma grown AL(2) O(3) and ALN insulators on silicon and effects of plasma annealing on thermally grown SiO(2) films

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dc.contributor.authorChandra, Sudhir
dc.date.accessioned2025-02-09T10:19:57Z
dc.date.issued1980
dc.identifier.urihttp://ir.iitd.ac.in/handle/123456789/7012
dc.language.isoen
dc.publisherIIT Delhi
dc.subjectPlasma Physics
dc.subjectThin films
dc.subjectFluid Mechanics
dc.titleProperties of RF plasma grown AL(2) O(3) and ALN insulators on silicon and effects of plasma annealing on thermally grown SiO(2) films
dc.typeThesis

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