Time-dependent dielectric breakdown-reliability characterization and analysis of advanced CMOS devices

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dc.contributor.authorAsifa Amin
dc.date.accessioned2025-12-10T06:54:06Z
dc.date.issued2025-07-03
dc.identifier.urihttps://ir.iitd.ac.in/handle/123456789/7829
dc.language.isoen
dc.publisherIIT Delhi
dc.subjectSemiconductor
dc.subjectElectromigration
dc.subjectRadio frequency
dc.subjectWeibull distribution
dc.subjectThermochemical
dc.titleTime-dependent dielectric breakdown-reliability characterization and analysis of advanced CMOS devices
dc.typeThesis

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